Photosensitive resin composition and light blocking layer using the same

公开(公告)号:
US8834749B2
公开(公告)日:
2014-09-16
申请号:
US13/947232
申请日:
2013-07-22
授权日:
2014-09-16
受理局:
美国
专利类型:
授权发明
简单法律状态:
有效
法律状态/事件:
授权
IPC分类号:
F21V9/00 | G03B11/00 | G02F1/361 | G02B5/02 | G02C7/10 | G03C1/00 | G03F7/00 | G02F1/1335 | G02B5/23
战略新兴产业分类:
先进石化化工新材料
国民经济行业分类号:
C4350 | C3874 | C4090 | C3879
当前申请(专利权)人:
CHEIL INDUSTRIES INC.
原始申请(专利权)人:
CHEIL INDUSTRIES INC.
当前申请(专利权)人地址:
290 GONGDAN-DONG, GUMI-SI, GYEONGSANGBUK-DO, 730-710, GUMI-SI, KOREA, REPUBLIC OF
工商统一社会信用代码:
-
工商登记状态:
其他
工商注册地址:
-
工商成立日期:
1963
工商企业类型:
-
发明人:
CHOI, HYUN-MOO | LEE, CHANG-MIN | KIM, JI-HYE | AHN, KYUNG-WON | YU, A-RUM | YIM, JAE-BUM | CHEON, HWAN-SUNG | JUNG, JU-HO
代理机构:
ADDITON, HIGGINS & PENDLETON, P.A.
代理人:
-
摘要:
Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant and (E) a solvent, and a light blocking layer using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
技术问题语段:
The technical problem addressed in this patent text is to improve the quality of liquid crystal display devices by using a light blocking layer that prevents contrast reduction due to light transmitted through a thin film transistor. The invention suggests the use of a multifunctional material that can simultaneously function as a light blocking layer and a column spacer, which helps to achieve a more uniform pattern during the manufacturing process.
技术功效语段:
The patent text describes a photosensitive resin composition that can make patterns easily and resistant to chemicals. It can also control the angle of the pattern, creating a film step difference. This composition can create a light blocking layer pattern with a film step difference, simultaneously creating a black matrix and a column spacer.
权利要求:
1. A photosensitive resin composition, comprising (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent: wherein, in the above Chemical Formula 1, Y1 is a residual group of acid dianhydride, R1, R2, R40 and R41 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, wherein at least one of R1 and R2, or at least one of R40 and R41 is substituted or unsubstituted (meth)acrylate, R3 to R6 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, a1 to a4 are the same or different and are each independently integers ranging from 0 to 4, and b1 and b2 are the same or different and are each independently integers ranging from 0 to 10. 2. The photosensitive resin composition of claim 1, wherein the cardo-based resin is a compound represented by the following Chemical Formula 2: [Chemical Formula 2] wherein, in the above Chemical Formula 2, Y2 is a residual group of acid dianhydride, Z1 and Z2 are the same or different and are each independently a residual group of acid anhydride, R7, R8, R13, R14, R42 and R43 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, wherein at least one of R7 and R8, at least one of R13 and R14, or at least one of R42 and R43 is independently substituted or unsubstituted (meth)acrylate, R9 to R12 and R15 to R18 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, a5 to a12 are the same or different and are each independently integers ranging from 0 to 4, b3 to b6 are the same or different and are each independently integers ranging from 0 to 10, and n1 is an integer ranging from 1 to 20. 3. The photosensitive resin composition of claim 1, wherein when R1 and R2 are hydrogen, and at least one of R40 and R41 is substituted or unsubstituted (meth)acrylate in the above Chemical Formula 1, the cardo-based resin further comprises a repeating unit represented by the following Chemical Formula 5: wherein, in the above Chemical Formula 5, Y3 is a residual group of acid dianhydride, R19 to R22 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, a13 to a16 are the same or different and are each independently integers ranging from 0 to 4, and b7 and b8 are the same or different and are each independently integers ranging from 0 to 10. 4. The photosensitive resin composition of claim 3, wherein the cardo-based resin is a compound represented by the following Chemical Formula 6 [Chemical Formula 6] wherein, in the above Chemical Formula 6, Y4 and Y5 are the same or different and are each independently a residual group of acid dianhydride, Z3 and Z4 are the same or different and are each independently a residual group of acid anhydride, R23 and R24 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, wherein at least one of R23 and R24 is substituted or unsubstituted (meth)acrylate, R25 to R36 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, a17 to a28 are the same or different and are each independently integers ranging from 0 to 4, b9 to b14 are the same or different and are each independently integers ranging from 0 to 10, and n2 and n3 are the same or different and are each independently integers ranging from 1 to 10. 5. The photosensitive resin composition of claim 1, wherein the cardo-based resin has a weight average molecular weight of about 1,000 to about 20,000 g/mol. 6. The photosensitive resin composition of claim 1, wherein the cardo-based resin comprises: a first cardo-based resin having a weight average molecular weight of greater than or equal to about 1,000 g/mol and less than about 6,500 g/mol, and a second cardo-based resin having a weight average molecular weight of greater than about 6,500 g/mol and less than or equal to about 20,000 g/mol. 7. The photosensitive resin composition of claim 6, wherein the cardo-based resin comprises the first cardo-based resin and the second cardo-based resin in a weight ratio of about 1:9 to about 9:1. 8. The photosensitive resin composition of claim 1, wherein the colorant comprises a dye, a pigment, or a combination thereof. 9. The photosensitive resin composition of claim 8, wherein the pigment comprises an organic pigment, an inorganic pigment, or a combination thereof, the organic pigment comprises a black organic pigment, and the inorganic pigment comprises carbon black, chromium oxide, iron oxide, titan black, titanium carbide, aniline black, or a combination thereof. 10. The photosensitive resin composition of claim 1, wherein the photosensitive resin composition comprises: about 0.5 to about 30 wt % of the binder resin (A); about 1 to about 20 wt % of the photopolymerizable monomer (B); about 0.1 to about 10 wt % of the photopolymerization initiator (C); about 1 to about 50 wt % of the colorant (D); and balance of the solvent (E). 11. A light blocking layer manufactured using the photosensitive resin composition of claim 1. 12. The light blocking layer of claim 11, wherein the light blocking layer has a pattern tilt angle ranging from about 20 to about 50° in a pattern having a film step difference.
技术领域:
[0002]This disclosure relates to a photosensitive resin composition and a light blocking layer using the same. BACKGROUND [0003]A liquid crystal display device includes a lower substrate on which a color filter including a light blocking layer and an ITO pixel electrode are formed; an active circuit portion including a liquid crystal layer, a thin film transistor, and a capacitor layer; and an upper substrate on which an ITO pixel electrode is formed. [0004]The light blocking layer blocks uncontrolled light transmitted out of a transparent pixel electrode of a substrate and thus prevents contrast reduction due to light transmitted through a thin film transistor. Red, green, and blue light blocking layers transmit light with a predetermined wavelength of white light and display colors. [0005]There has been a recent focus on the manufacture of light blocking layers using a multifunctional material such as a material simultaneously having two functions in one process. For example, a black column spacer capable of simultaneously functioning as a black matrix and a column spacer may be realized using one material in one process. [0006]The black column spacer may provide the black matrix and the column spacer with the same pattern. The pattern is required to have a film step difference between a more exposed region and a less exposed region by using a half tone mask or a slit mask during the pattern formation.
背景技术:
-
发明内容:
[0007]One embodiment provides a photosensitive resin composition that can have excellent pattern-forming capability, developability, and/or chemical resistance as well as being capable of controlling a pattern tilt angle to have a film step difference during formation of a pattern. [0008]Another embodiment provides a light blocking layer manufactured by using the photosensitive resin composition. [0009]One embodiment provides a photosensitive resin composition that includes (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent. [0010] [0011]In the above Chemical Formula 1, [0012]Y1 is a residual group of acid dianhydride, [0013]R1, R2, R40 and R41 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0014]wherein at least one of R1 and R2 or at least one of R40 and R41 is substituted or unsubstituted (meth)acrylate, [0015]R3 to R6 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0016]a1 to a4 are the same or different and are each independently integers ranging from 0 to 4, and [0017]b1 and b2 are the same or different and are each independently integers ranging from 0 to 10. [0018]The cardo-based resin may be a compound represented by the following Chemical Formula 2. [0019] [0020]In the above Chemical Formula 2, [0021]Y2 is a residual group of acid dianhydride, [0022]Z1 and Z2 are the same or different and are each independently a residual group of acid anhydride, [0023]R7, R8, R13, R14, R42 and R43 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0024]wherein at least one of R7 and R8, at least one of R13 and R14, or at least one of R42 and R43 is independently substituted or unsubstituted (meth)acrylate, [0025]R9 to R12 and R15 to R18 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0026]a5 to a12 are the same or different and are each independently integers ranging from 0 to 4, [0027]b3 to b6 are the same or different and are each independently integers ranging from 0 to 10, and [0028]n1 is an integer ranging from 1 to 20. [0029]When R1 and R2 are hydrogen, and at least one of R40 and R41 is substituted or unsubstituted (meth)acrylate in the above Chemical Formula 1, the cardo-based resin may further include a repeating unit represented by the following Chemical Formula 5. [0030] [0031]In the above Chemical Formula 5, [0032]Y3 is a residual group of acid dianhydride, [0033]R19 to R22 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0034]a13 to a16 are the same or different and are each independently integers ranging from 0 to 4, and [0035]b7 and b8 are the same or different and are each independently integers ranging from 0 to 10 [0036]The cardo-based resin may be a compound represented by the following Chemical Formula 6. [0037] [0038]In the above Chemical Formula 6, [0039]Y4 and Y5 are the same or different and are each independently a residual group of acid dianhydride, [0040]Z3 and Z4 are the same or different and are each independently a residual group of acid anhydride, [0041]R23 and R24 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0042]wherein at least one of R23 and R24 is substituted or unsubstituted (meth)acrylate, [0043]R25 to R36 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0044]a17 to a28 are the same or different and are each independently integers ranging from 0 to 4, [0045]b9 to b14 are the same or different and are each independently integers ranging from 0 to 10, and [0046]n2 and n3 are the same or different and are each independently integers ranging from 1 to 10. [0047]The cardo-based resin (B) may have a weight average molecular weight of about 1,000 to about 20,000 g/mol. [0048]The cardo-based resin may include a first cardo-based resin having a weight average molecular weight of greater than or equal to about 1,000 g/mol and less than about 6,500 g/mol and a second cardo-based resin having a weight average molecular weight of greater than about 6,500 g/mol and less than or equal to about 20,000 g/mol. [0049]The cardo-based resin may include the first cardo-based resin and the second cardo-based resin in a weight ratio of about 1:9 to about 9:1. [0050]The colorant may include a dye, a pigment, or a combination thereof. [0051]The pigment may include an organic pigment, an inorganic pigment, or a combination thereof, the organic pigment may include a black organic pigment, and the inorganic pigment may include carbon black, chromium oxide, iron oxide, titan black, titanium carbide, aniline black, or a combination thereof. [0052]The photosensitive resin composition may include about 0.5 to about 30 wt % of the binder resin (A); about 1 to about 20 wt % of the photopolymerizable monomer (B); about 0.1 to about 10 wt % of the photopolymerization initiator (C); about 1 to about 50 wt % of the colorant (D); and balance of the solvent (E). [0053]Another embodiment provides a light blocking layer manufactured using the photosensitive resin composition. [0054]The light blocking layer may have a pattern having a film step difference, in which a pattern tilt angle is in a range of about 20 to about 50°. [0055]Other embodiments are included in the following detailed description. [0056]The present invention may form a light blocking layer pattern having a film step difference by using a photosensitive resin composition having excellent pattern-forming capability, developability, and chemical resistance as well as capable of controlling a pattern tilt angle and accordingly, can provide a black matrix and a column spacer in one process, simultaneously.
具体实施方式:
[0065]The present invention will be described more fully hereinafter in the following detailed description of the invention, in which some but not all embodiments of the invention are described. Indeed, this invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will satisfy applicable legal requirements. [0066]As used herein, when a specific definition is not otherwise provided, the term “substituted” refers to one substituted with a substituent including halogen (F, Cl, Br or I), a hydroxyl group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, an azido group, an amidino group, a hydrazino group, a hydrazono group, a carbonyl group, a carbamyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C30 aryl group, a C3 to C20 cycloalkyl group, a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C30 heteroaryl group, or a combination thereof, instead of at least one hydrogen. [0067]As used herein, when a specific definition is not otherwise provided, the term “hetero” may refer to a cyclic compound substituted with at least one hetero atom of N, O, S and/or P, in place of at least one C (carbon atom) of the cyclic compound. [0068]As used herein, when a specific definition is not otherwise provided, “(meth)acrylate” refers to both “acrylate” and “methacrylate”, and “(meth)acrylic acid” refers to “acrylic acid” and “methacrylic acid”. [0069]The photosensitive resin composition according to one embodiment includes (A) a binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant, and (E) a solvent. [0070]Hereinafter, each component is described in detail. [0071](A) Binder Resin [0072]In one embodiment, the binder resin may be a cardo-based resin. The cardo-based resin may be a compound including a repeating unit represented by the following Chemical Formula 1. [0073][Chemical Formula 1] [0074] [0075]In the above Chemical Formula 1, [0076]Y1 is a residual group of acid dianhydride, [0077]R1, R2, R40 and R41 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0078]wherein at least one of R1 and R2, or at least one of R40 and R41 is substituted or unsubstituted (meth)acrylate, [0079]R3 to R6 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0080]a1 to a4 are the same or different and are each independently integers ranging from 0 to 4, and [0081]b1 and b2 are the same or different and are each independently integers ranging from 0 to 10. [0082]The cardo-based resin may improve heat resistance, chemical resistance, and/or close-contacting (adhesive) properties of the photosensitive resin composition. [0083]In addition, the cardo-based resin according to one embodiment can have a spirobifluorene backbone shown in the above Chemical Formula 1. The spirobifluorene backbone can have a stable stereo-structure having high rigidity. This cardo-based resin may maintain film step difference of a pattern realized after development during the post baking due to decreased melting characteristics. In other words, the cardo-based resin according to one embodiment can have a structure having small fluidity and may adjust a pattern tilt angle in a pattern having a film step difference when included in the photosensitive resin composition. [0084]The cardo-based resin may include at least one (meth)acrylate group as in the above Chemical Formula 1. The (meth)acrylate group participates in a reaction for forming a pattern during the exposure and may improve sensitivity of the pattern. [0085]In addition, since the cardo-based resin is synthesized by introducing the (meth)acrylate group in the last step after synthesis of a polymer including a residual group of acid dianhydride substituted with a carboxyl group, a substituent of the (meth)acrylate group may be adjusted. Accordingly, melting characteristic of the cardo-based resin and sensitivity of a pattern due to its rigidity structure may be adjusted. [0086]The cardo-based resin including the repeating unit represented by the above Chemical Formula 1 may be specifically a compound represented by the following Chemical Formula 2. [0087] [0088]In the above Chemical Formula 2, [0089]Y2 is a residual group of acid dianhydride, [0090]Z1 and Z2 are the same or different and are each independently a residual group of acid anhydride, [0091]R7, R8, R13R14R42 and R43 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0092]wherein at least one of R7 and R8, at least one of R13 and R14, or at least one of R42 and R43 is independently substituted or unsubstituted (meth)acrylate, [0093]R9 to R12 and R15 to R18 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0094]a5 to a12 are the same or different and are each independently integers ranging from 0 to 4, [0095]b3 to b6 are the same or different and are each independently integers ranging from 0 to 10, and [0096]n1 is an integer ranging from 1 to 20. [0097]The cardo-based resin may be more specifically a compound represented by the following Chemical Formula 3 and/or a compound represented by the following Chemical Formula 4. [0098] [0099]In the above Chemical Formula 3, n4 is an integer ranging from 1 to 20. [0100][Chemical Formula 4] [0101] [0102]In the above Chemical Formula 4, n7 is an integer ranging from 1 to 20. [0103]When R1 and R2 are hydrogen, and at least one of R40 and R41 is the substituted or unsubstituted (meth)acrylate group in the above Chemical Formula 1, the cardo-based resin may further include a repeating unit represented by the following Chemical Formula 5. [0104] [0105]In the above Chemical Formula 5, [0106]Y3 is a residual group of acid dianhydride, [0107]R19 to R22 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0108]a13 to a16 are the same or different and are each independently integers ranging from 0 to 4, and [0109]b7 and b8 are the same or different and are each independently integers ranging from 0 to 10. [0110]When R1 and R2 are hydrogen, and at least one of R40 and R41 is the substituted or unsubstituted (meth)acrylate group, the cardo-based resin including the repeating unit represented by the above Chemical Formula 1 and the repeating unit represented by the above Chemical Formula 5 may be specifically a compound represented by the following Chemical Formula 6. [0111][Chemical Formula 6] [0112] [0113]In the above Chemical Formula 6, [0114]Y4 and Y5 are the same or different and are each a residual group of acid dianhydride, [0115]Z3 and Z4 are the same or different and are each independently a residual group of acid anhydride, [0116]R23 and R24 are the same or different and are each independently hydrogen, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, substituted or unsubstituted C6 to C30 aryl, or substituted or unsubstituted (meth)acrylate, [0117]wherein at least one of R23 and R24 is substituted or unsubstituted (meth)acrylate, [0118]R25 to R36 are the same or different and are each independently substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkynyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C3 to C20 cycloalkenyl, substituted or unsubstituted C3 to C20 cycloalkynyl, or substituted or unsubstituted C6 to C30 aryl, [0119]a17 to a28 the same or different and are each are independently integers ranging from 0 to 4, [0120]b9 to b14 are the same or different and are each independently integers ranging from 0 to 10, and [0121]n2 and n3 are the same or different and are each independently integers ranging from 1 to 10. [0122]The compound represented by the above Chemical Formula 6 may be more specifically represented by the following Chemical Formula 7. [0123][Chemical Formula 7] [0124] [0125]In the above Chemical Formula 7, n5 and n6 are the same or different and are each independently integers ranging from 1 to 10 [0126]The cardo-based resin (B) may have a weight average molecular weight of about 1,000 to about 20,000 g/mol, for example about 3,000 to about 10,000 g/mol. Within the above range of the weight average molecular weight, during manufacture of a light blocking layer, excellent pattern and developability may be provided. [0127]The cardo-based resin including a repeating unit wherein at least one of R1 and R2 is the substituted or unsubstituted (meth)acrylate group and R40 and R41 are hydrogen in the above Chemical Formula 1 may include two kinds of cardo-based resins having a different molecular weight from each other. Specifically, the cardo-based resin may include a mixture of a first cardo-based resin having a weight average molecular weight of greater than or equal to about 1,000 g/mol and less than about 6,500 g/mol and a second cardo-based resin having a weight average molecular weight of greater than about 6,500 g/mol and less than or equal to about 20,000 g/mol. Herein, the first cardo-based resin and the second cardo-based resin may be mixed in a weight ratio of about 1:9 to about 9:1, for example in a weight ratio of about 4:6 to about 6:4. When the two kinds of cardo-based resins having a different molecular weight from each other are mixed within the above weight ratio range, viscosity may be maintained appropriately and excellent pattern and developability may be obtained during manufacture of a light blocking layer. [0128]The binder resin may further include an acrylic-based resin as well as the above-described cardo-based resin. [0129]The acrylic-based resin is a copolymer of a first ethylenic unsaturated monomer and a second ethylenic unsaturated monomer that is copolymerizable with the first ethylenic unsaturated monomer, and is a resin including at least one acrylic-based repeating unit. [0130]The first ethylenic unsaturated monomer is an ethylenic unsaturated monomer including at least one carboxyl group. Examples of the monomer include without limitation acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, and the like, and combinations thereof. [0131]The acrylic-based binder resin may include the first ethylenic unsaturated monomer in an amount ranging from about 5 to about 50 wt %, for example, from about 10 to about 40 wt %, based on the total amount (weight) of the acrylic-based resin. In some embodiments, the acrylic-based binder resin may include the first ethylenic unsaturated monomer in an amount of about 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, or 50 wt %. Further, according to some embodiments of the present invention, the amount of the first ethylenic unsaturated monomer can be in a range from about any of the foregoing amounts to about any other of the foregoing amounts. [0132]Examples of the second ethylenic unsaturated monomer may include without limitation aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, vinylbenzylmethylether, and the like; unsaturated carboxylic acid ester compounds such as methyl(meth)acrylate, ethyl(meth)acrylate, butyl(meth)acrylate, 2-hydroxyethyl(meth)acrylate, 2-hydroxy butyl(meth)acrylate, benzyl(meth)acrylate, cyclohexyl(meth)acrylate, phenyl(meth)acrylate, and the like; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl(meth)acrylate, 2-dimethylaminoethyl(meth)acrylate, and the like; carboxylic acid vinyl ester compounds such as vinyl acetate, vinyl benzoate, and the like; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl(meth)acrylate and the like; vinyl cyanide compounds such as (meth)acrylonitrile and the like; unsaturated amide compounds such as (meth)acrylamide and the like; and the like. They may be used singularly or as a mixture of more than two. [0133]Examples of the acrylic-based resin may include without limitation methacrylic acid/benzylmethacrylate/styrene copolymers, methacrylic acid/benzylmethacrylate/2-hydroxyethylmethacrylate copolymers, methacrylic acid/benzyl methacrylate/styrene/2-hydroxyethylmethacrylate copolymers, and the like, but are not limited thereto. They may be used singularly or as a mixture of two or more. [0134]The acrylic-based resin may have a weight average molecular weight ranging from about 3,000 to about 150,000 g/mol, for example, about 5,000 to about 50,000 g/mol, and as another example about 2,000 to about 30,000 g/mol. When the acrylic-based resin has a weight average molecular weight within the above range, the photosensitive resin composition can have good physical and/or chemical properties, appropriate viscosity, and/or close-contacting (adhesive) properties with a substrate during manufacture of a light blocking layer. [0135]The acrylic-based resin may have an acid value ranging from about 15 to about 60 mgKOH/g, for example about 20 to about 50 mgKOH/g. When acrylic-based resin has an acid value within the above range, excellent pixel resolution may be realized. [0136]The photosensitive resin composition may include the binder resin in an amount of about 0.5 to about 30 wt %, for example about 1 to about 25 wt %, based on the total amount (weight) of the photosensitive resin composition. In some embodiments, the photosensitive resin composition may include the binder resin in an amount of about 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, or 30 wt %. Further, according to some embodiments of the present invention, the amount of the binder resin can be in a range from about any of the foregoing amounts to about any other of the foregoing amounts. [0137]When the binder resin is included in an amount within the above range, viscosity may be maintained appropriately and excellent pattern, processability, and developability may be obtained during manufacture of a light blocking layer. [0138](B) Photopolymerizable Monomer [0139]The photopolymerizable monomer may be mono-functional and/or multifunctional ester of (meth)acrylic acid including at least one ethylenic unsaturated double bond. [0140]The photopolymerizable monomer causes sufficient polymerization at exposure during pattern forming processes to form patterns that can have excellent heat resistance, light resistance, and/or chemical resistance, due to the ethylenic unsaturated double bond. [0141]Examples of the photopolymerizable monomer may include without limitation ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethylether (meth)acrylate, trimethylol propane tri(meth)acrylate, tris(meth)acryloyloxyethyl phosphate, novolacepoxy (meth)acrylate, and the like, and combinations thereof. [0142]Commercially available examples of the photopolymerizable monomer are as follows. The mono-functional (meth)acrylic acid ester may include without limitation Aronix M-101®, M-111®, M-114® (TOAGOSEI CHEMICAL INDUSTRY CO., LTD.); KAYARAD TC-110S®, TC-120S® (NIPPON KAYAKU CO., LTD.); V-158®, V-2311® (OSAKA ORGANIC CHEMICAL IND., LTD.), and the like. Examples of a difunctional (meth)acrylic acid ester may include without limitation Aronix M-210®, M-240®, M-6200® (TOAGOSEI CHEMICAL INDUSTRY CO., LTD.), KAYARAD HDDA®, HX-220®, R-604® (NIPPON KAYAKU CO., LTD.), V-260®, V-312®, V-335 HP® (OSAKA ORGANIC CHEMICAL IND., LTD.), and the like. Examples of a tri-functional (meth)acrylic acid ester may include without limitation Aronix M-309®, M-400®, M-405®, M-450®, M-7100®, M-8030®, M-8060® (TOAGOSEI CHEMICAL INDUSTRY CO., LTD.), KAYARAD TMPTA®, DPCA-20®, DPCA-30®, DPCA-60®, DPCA-120® (NIPPON KAYAKU CO., LTD.), V-295®, V-300®, V-360®, V-GPT®, V-3PA®, V-400® (Osaka Yuki Kayaku Kogyo Co. Ltd.), and the like. The commercially available products may be used singularly or as a mixture of two or more kinds. [0143]The photopolymerizable monomer may be treated with acid anhydride to improve developability. [0144]The photosensitive resin composition may include the photopolymerizable monomer in an amount ranging from about 1 to about 20 wt %, for example about 1 to about 15 wt % based on the total amount of the photosensitive resin composition. In some embodiments, the photosensitive resin composition may include the photopolymerization monomer in an amount of about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, or 20 wt %. Further, according to some embodiments of the present invention, the amount of the photopolymerization monomer can be in a range from about any of the foregoing amounts to about any other of the foregoing amounts. [0145]When the photopolymerizable monomer is included in an amount within the above range, curing at exposure during pattern forming processes can be sufficiently performed, and the photopolymerizable monomer can have good sensitivity under oxygen, and compatibility with the binder resin. [0146](C) Photopolymerization Initiator [0147]The photopolymerization initiator may be a generally-used initiator in a photosensitive resin composition. Examples of the photopolymerization initiator may include without limitation acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, triazine-based compounds, and the like, and combinations thereof. [0148]Examples of the acetophenone-based compound include without limitation 2,2′-diethoxy acetophenone, 2,2′-dibutoxy acetophenone, 2-hydroxy-2-methylpropinophenone, p-t-butyltrichloro acetophenone, p-t-butyldichloro acetophenone, 4-chloro acetophenone, 2,2′-dichloro-4-phenoxy acetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like, and combinations thereof. [0149]Examples of the benzophenone-based compound include without limitation benzophenone, benzoyl benzoate, benzoyl methyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4′-bis(dimethyl amino)benzophenone, 4,4′-bis(diethylamino)benzophenone, 4,4′-dimethylaminobenzophenone, 4,4′-dichlorobenzophenone, 3,3′-dimethyl-2-methoxybenzophenone, and the like, and combinations thereof. [0150]Examples of the thioxanthone-based compound include without limitation thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2-chlorothioxanthone, and the like, and combinations thereof. [0151]Examples of the benzoin-based compound include without limitation benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethylketal, and the like, and combinations thereof. [0152]Examples of the triazine-based compound include without limitation 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3′,4′-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4′-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloro methyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphto-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphto-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-trichloromethyl(piperonyl)-6-triazine, 2-4-trichloromethyl(4′-methoxystyryl)-6-triazine, and the like, and combinations thereof. [0153]The photopolymerization initiator may further include a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, a biimidazole-based compound, and the like and combinations thereof, in addition to or as an alternative to the aforementioned photopolymerization initiators. [0154]The photopolymerization initiator absorbs light and is excited and then transmits energy, and it may be used with a photo-sensitizer causing a chemical reaction. [0155]The photosensitive resin composition may include the photopolymerization initiator in an amount of about 0.1 to about 10 wt %, for example about 0.5 to about 3 wt %, based on the total amount (weight) of the photosensitive resin composition. In some embodiments, the photosensitive resin composition may include the photopolymerization initiator in an amount of about 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 wt %. Further, according to some embodiments of the present invention, the amount of the photopolymerization initiator can be in a range from about any of the foregoing amounts to about any other of the foregoing amounts. [0156]When the photopolymerization initiator is included in an amount within the above range, sensitivity of a radical and/or color concentration of a photosensitive resin composition solution can be maintained appropriately, and decrease in transmittance due to non-reacting initiators transmittance may be prevented. [0157](D) Colorant [0158]The colorant may include a dye, a pigment or a combination thereof. [0159]The pigment may include an organic pigment, an inorganic pigment, or a combination thereof. To implement a high optical density, the organic pigment and the inorganic pigment may be mixed. [0160]The organic pigment may be a black organic pigment. The black organic pigment can have insulation properties. [0161]Examples of the black organic pigment may include without limitation perylene black, cyanine black, and the like, and may be used singularly or in a mixture of two or more. [0162]The black organic pigment may be a mixture of two or more kinds of organic pigments to show a black color. Combinations of any pigment showing a black color by mixing in a color coordinate pigment may be used. For example blackening combinations of at least two pigments selected from red pigments, blue pigments, green pigments, violet-based pigments, yellow-based pigments, cyanine-based pigments, and margenta-based pigments may be used. For example, a blackening mixture of a red pigment, a blue pigment, and a green pigment may be used, or a blackening mixture of a green pigment and a violet-based pigment may be used. [0163]Examples of the red pigment may include without limitation perylene-based pigments, anthraquinone-based pigments, dianthraquinone-based pigments, azo-based pigments, diazo-based pigments, quinacridone-based pigments, anthracene-based pigments, and the like, and combinations thereof. For example, the red pigment may include a perylene pigment, a quinacridone pigment, a naphthol AS, a sicomin pigment, an anthraquinone (sudan I, II, III, R), dianthraquinonylate, bis azo, benzopyrane, and the like, or a combination thereof. [0164]Examples of the blue pigment may include without limitation metal phthalocyanine-based pigments, indanthone-based pigments, indophenol-based pigments, and the like, and combinations thereof. Specific examples of the blue pigment may include without limitation phthalocyanine metal complexes such as copper phthalocyanine, chloro copper phthalocyanine, chloro aluminum phthalocyanine, titanyl phthalocyanine, vanadic acid phthalocyanine, magnesium phthalocyanine, zinc phthalocyanine, iron phthalocyanine, cobalt phthalocyanine, and the like, and combinations thereof. [0165]Examples of the green pigment may include without limitation halogenated phthalocyanine-based pigments, and the like, and combinations thereof. For example, the green pigment may include polychloro copper phthalocyanine, polychloro bromo phthalocyanine, and the like, or a combination thereof. [0166]Examples of the violet-based pigment may include without limitation dioxazine violet, first violet B, methyl violet, indanthrene brilliant violet, and the like, and combinations thereof. [0167]Examples of the yellow-based pigment may include without limitation tetrachloro isoindolinone-based pigments, hansa-based pigments, benzidine yellow-based pigments, azo-based pigments, and the like, and combinations thereof. For example, the yellow-based pigment may include hansa yellow (10G, 5G, 3G, G, GR, A, RN, R), benzidine (G, GR), chrome yellow, permanent yellow (FGL, H10G, HR), anthracene, and the like, or a combination thereof. [0168]Examples of the cyanine-based pigment may include without limitation non-metal phthalocyanine, merocyanine, and the like, and combinations thereof. [0169]Examples of the magenta-based pigment may include without limitation dimethyl quinacridone, thio indigo, and the like, and combinations thereof. [0170]Examples of the inorganic pigment may include without limitation carbon black, chromium oxide, iron oxide, titan black, titanium carbide, aniline black, and the like. Such an inorganic pigment can have high resistance characteristics, and may be used singularly or in a mixture of two or more kinds. [0171]The organic pigment and the inorganic pigment may be used in a weight ratio of about 1 to about 10:1, for example about 2 to 7:about 1. Within the weight ratio range, processability may be stable, and a low dielectric constant may be provided. [0172]The photosensitive resin composition may further include a dispersing agent in order to improve dispersion of the pigment. [0173]The pigment may be surface-pretreated with a dispersing agent, or the pigment and dispersing agent may be added together during preparation of the photosensitive resin composition. [0174]Examples of the dye may include without limitation triphenylmethane-based dyes, anthraquinone-based dyes, azo-based dyes, and the like, and combinations thereof. In exemplary embodiments, a mixture of the triphenylmethane-based dye and at least one of the anthraquinone-based and azo-based dye may be used. [0175]The photosensitive resin composition may include the colorant in an amount of about 1 to about 50 wt %, for example about 5 to about 45 wt %, based on the total amount (weight) of the photosensitive resin composition. In some embodiments, the photosensitive resin composition may include the colorant in an amount of about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, or 50 wt %. Further, according to some embodiments of the present invention, the amount of the colorant can be in a range from about any of the foregoing amounts to about any other of the foregoing amounts. [0176]When the colorant is included in an amount within the above range, insulating properties may be improved, and high optical density and improved processability such as developability, and the like may be provided. [0177](E) Solvent [0178]Examples of the solvent may include without limitation alcohols such as methanol, ethanol, and the like; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, and the like; glycol ethers such as ethylene glycol methylether, ethylene glycol dimethylether, ethylene glycol ethylether, propylene glycol monomethylether, and the like; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate, and the like; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethylether, diethylene glycol monoethylether, diethylene glycol dimethylether, diethylene glycol methylethylether, diethylene glycol diethylether, and the like; propylene glycol alkylether acetates such as propylene glycol methylether acetate, propylene glycol propylether acetate, and the like; aromatic hydrocarbons such as toluene, xylene, and the like; ketones such as methylethylketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propylketone, methyl-n-butylketone, methyl-n-amylketone, 2-heptanone, and the like; saturated aliphatic monocarboxylic acid alkyl ester such as ethyl acetate, n-butyl acetate, isobutyl acetate, and the like; lactate alkyl esters such as methyl lactate, ethyl lactate, and the like; alkyl hydroxy acetate ester such as methyl hydroxyacetate, ethyl hydroxyacetate, butyl hydroxyacetate, and the like; alkoxyalkyl acetate esters such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethoxymethyl acetate, ethoxyethyl acetate, and the like; alkyl 3-hydroxypropionate ester such as methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, and the like; alkyl 3-alkoxypropionate esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, and the like; alkyl 2-hydroxypropionate ester such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, propyl 2-hydroxypropionate, and the like; alkyl 2-alkoxypropionate ester such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate, and the like; alkyl 2-hydroxy-2-methylpropionate esters such as methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, and the like; alkyl 2-alkoxy-2-methylpropionate esters such as methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, and the like; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, methyl 2-hydroxy-3-methylbutanoate, and the like; ketonate esters such as ethyl
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