权利要求：
1. A decoration member comprising:
a color expression layer comprising a light reflection layer and a light absorption layer provided on the light reflection layer; and
a substrate provided on one surface of the color expression layer,
wherein the light absorption layer comprises a copper nickel oxide (CuaNibOx), and
ω represented by Equation 1 is in a range of 0.001 to 0.7 when a component analysis is performed with respect to any one point of the light absorption layer:
ω=(Tx)×(σx)[Equation<mspace width="0.8em" height="0.8ex"/>1]f(T1)=T1T0(0<T1≤T0)f(T1)=f(T1+n×T0)[Equation<mspace width="0.8em" height="0.8ex"/>2]σx=a+bx×1.2[Equation<mspace width="0.8em" height="0.8ex"/>3]
wherein, in Equation 1, Tx represents a function value depending on T1 of a function represented by the f(T1), n represents a positive integer of 1 or more, and σx is represented by Equation 3,
wherein, in Equation 2, T1 represents a thickness of the light absorption layer comprising any one point of the light absorption layer in which the component analysis is performed and T0 is 60 nm, and
wherein, in Equation 3, a means an element content ratio of copper (Cu), b means an element content ratio of nickel (Ni), and x means an element content ratio of oxygen (O).
2. The decoration member of claim 1, wherein Tx is in a range of 0.01 to 0.5.
3. The decoration member of claim 1, wherein σx is in a range of 0.1 to 5.
4. The decoration member of claim 1, wherein a Hue-angle h* in CIE LCh color space of the light absorption layer is in a range of 315 to 360° and 0 to 150°.
5. The decoration member of claim 1, wherein the light reflection layer is constituted by a single layer or multiple layers comprising one or more types of materials selected from the group consisting of indium (In), titanium (Ti), and tin (Sn), silicon (Si), germanium (Ge), aluminum (Al), copper (Cu), nickel (Ni), vanadium (V), tungsten (W), tantalum (Ta), molybdenum (Mo), neodymium (Nb), Iron (Fe), chromium (Cr), cobalt (Co), gold (Au), and silver (Ag); an oxide, nitride, or an oxynitride thereof; carbon and a carbon composite.
6. The decoration member of claim 1, wherein the light absorption layer has a refractive index of 0 to 8 at a wavelength of 400 nm.
7. The decoration member of claim 1, wherein the light absorption layer has an extinction coefficient of greater than 0 and less than or equal to 4 at a wavelength of 400 nm.
8. The decoration member of claim 1, wherein the light absorption layer comprises two or more points having different thicknesses.
9. The decoration member of claim 1, wherein the color expression layer further comprises a color film.
10. The decoration member of claim 1, wherein the color expression or the substrate comprises a pattern layer.
11. The decoration member of claim 10, wherein the pattern layer comprises a convex or concave shape having a cross section having an asymmetric structure.
12. The decoration member of claim 1, wherein the decoration member has dichroism of ΔE*ab>1.
13. The decoration member of claim 1, wherein the substrate comprises a plastic injection molding or a glass substrate for a cosmetic case.
14. The decoration member of claim 13, wherein the plastic injection molding comprises at least one of polypropylene (PP), polystyrene (PS), polyvinylacetate (PVAc), polyacrylate, polyethylene terephthalate (PET), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA), ethylene-vinyl acetate copolymer (EVA), polycarbonate (PC), polyamide, and styrene-acrylonitrile copolymer (SAN).
具体实施方式：
BEST MODE
[0023]Hereinafter, the present specification will be described in detail.
[0024]In the present specification, “or” means “and/or” when “or” selectively comprises them listed or comprises all of them listed, unless otherwise defined.
[0025]In the present specification, “layer” means covering 70% or more of an area in which the layer exists. Preferably, the “layer” means covering 75% or more and preferably 80% or more.
[0026]In the present specification, a “thickness” of a layer means a shortest distance from a lower surface to an upper surface of the layer.
[0027]In the present specification, a color represented by a decoration member may be defined by spectral characteristics of a light source, reflectance of an object, and color viewing efficiency of an observer.
[0028]For objective color expression, color measurement is required at standard light sources and a standard observer, and a color is expressed in coordinates of a color space. The color of the decoration member may be represented by CIE Lab (L*a*b*) coordinates or LCh coordinates which provide a visually uniform color space. L* represents lightness, +a* represents redness, −a* represents greenness, +b* represents yellowness, −b* represents blueness, and C* and h* will be described later. A total color difference according to a position of the observation in the color space may be expressed as ΔE·ab=√{square root over ((ΔL)2+(Δa)2+(Δb)2)}.
[0029]The color measurement may adopt a spectrophotometer (CM-2600d, manufactured by Konica Minolta Co., Ltd.) and reflectance of a sample may be optically analyzed and the reflectance for each wavelength may be represented through a spectrophotometer, and as a result, a spectral reflectance graph and a converted color coordinate may be obtained. In this case, data is obtained at a viewing angle of 8 degrees and the decoration member is measured in horizontal and vertical directions in order to view dichroism of the decoration member.
[0030]The viewing angle as an angle formed by a straight line d1 in a normal direction of the surface of a color expression layer of the decoration member and a straight line d2 passing through the spectrophotometer and one point of the decoration member to be measured generally has a range of 0 to 90 degrees.
[0031]A case where the viewing angle is 0 degree means measuring in a direction which is the same as the normal direction of the surface of the color expression layer of the decoration member.
[0032]In the present specification, a “light absorption layer” and a “light reflection layer” are layers having relative physical properties, the light absorption layer may mean a layer having a higher light absorption than the light reflection layer and the light reflection layer may mean a layer having a higher light reflectivity than the light absorption layer.
[0033]Each of the light absorption layer and the light reflection layer may be constituted by a single layer or constituted by two or more layers.
[0034]In the present specification, the light absorption layer and the light refection layer are named according to functions thereof. In regard to light having a specific wavelength, a layer that reflects light relatively much may be represented by the light reflection layer and a layer that reflects light relatively little may be represented by the light absorption layer.
[0035]FIG. 1 illustrates a lamination structure of a decoration member according to an embodiment of the present specification. In FIG. 1, a decoration member comprising a color expression layer 100 and a substrate 101 is illustrated. The color expression layer 100 comprises a light reflection layer 201 and a light absorption layer 301. Although FIG. 1 illustrates that the substrate 101 is provided on the light absorption layer 301 of the color expression layer 100, the substrate 101 may be provided on the light reflection layer 201.
[0036]Through FIG. 2, the light absorption layer and the light reflection layer will be described. In the decoration member of FIG. 2, each layer is laminated in the order of an Li−1 layer, an Li layer, and an Li+1 layer based on a light input direction, and an interface Ii is positioned between the Li−1 layer and the Li layer and an interface Ii+1 is located between the layer Li and the Li+1 layer.
[0037]When irradiating light having a specific wavelength in a direction perpendicular to each layer so that thin film interference does not occur, the reflectance at the interface Ii may be expressed by Equation 1 below.
[ni(λ)-ni-1(λ)]2+[ki(λ)-ki-1(λ)]2[ni(λ)+ni-1(λ)]2+[ki(λ)+ki-1(λ)]2[Equation<mspace width="0.8em" height="0.8ex"/>1]
[0038]In Equation 1, ni(λ) denotes a refractive index according to a wavelength λ of an i-th layer and ki(λ) denotes an extinction coefficient according to the wavelength λ of the i-th layer. The extinction coefficient is a measure that may define how strongly a target material absorbs light at a specific wavelength, and the definition is described below.
[0039]By applying Equation 1 above, when a sum of the reflectances for each wavelength at the interface Ii calculated at each wavelength is represented by Ri, the Ri is represented by Equation 2 below.
Ri=∑λ=380<mspace width="0.6em" height="0.6ex"/>nmλ=780<mspace width="0.6em" height="0.6ex"/>nm[ni(λ)-ni-1(λ)]2+[ki(λ)-ki-1(λ)]2[ni(λ)+ni-1(λ)]2+[ki(λ)+ki-1(λ)]2<mspace width="0.em" height="0.ex"/>Δλ∑λ=380<mspace width="0.6em" height="0.6ex"/>nmλ=780<mspace width="0.6em" height="0.6ex"/>nmΔλ[Equation<mspace width="0.8em" height="0.8ex"/>2]
[0040]Hereinafter, the decoration member comprising the light reflection layer and the light absorption layer described above will be described.
[0041]The present specification provides a decoration member which comprises: a color expression layer comprising a light reflection layer and a light absorption layer provided on the light reflection layer; and a substrate provided on one surface of the color expression layer, in which the light absorption layer comprises a copper nickel oxide (CuaNibOx) and when a component analysis is performed at any one point of the light absorption layer, ω expressed by Equation 1 below is 0.001 or more and 0.7 or less.
ω=(Tx)×(σx)[Equation<mspace width="0.8em" height="0.8ex"/>1]f(T1)=T1T0(0<T1≤T0)f(T1)=f(T1+n×T0)[Equation<mspace width="0.8em" height="0.8ex"/>2]σx=a+bx×1.2[Equation<mspace width="0.8em" height="0.8ex"/>3]
[0042]In Equation 1, Tx represents a function value depending on T1 of a function represented by the f(T1), n represents a positive integer of 1 or more, and σx is represented by Equation 3 above,
[0043]in Equation 2 above, T1 represents a thickness of the light absorption layer comprising any one point of the light absorption layer in which the component analysis is performed and T0 is 60 nm, and
[0044]in Equation 3 above, the a means an element content ratio of copper (Cu), the b means the element content ratio of nickel (Ni), and the x means the element content ratio of oxygen (O). For example, when the contents of copper (Cu), nickel (Ni) and oxygen (O) at one point are 57.5%, 9.8%, and 39.7%, respectively, a, b, and c may be expressed as 0.575, 0.098, and 0.397, respectively.
[0045]In the present specification, a content ratio of a specific element may mean an atomic percentage (at %) of a specific element at any one point of the light absorption layer in which the component analysis is performed.
[0046]In the decoration member according to an embodiment of the present specification, a light absorbing layer comprises copper nickel oxide (CuaNibOc), by controlling the content ratio of each element of copper nickel oxide and adjusting the thickness of the light absorption layer to a specific range, the warm tone may be observed through the light absorption layer. In this case, a relational expression between the content ratio of each element of the copper nickel oxide and the thickness of the light absorption layer may be represented by a warm tone parameter ω represented by Equation 1 above. The warm tone parameter may be represented by ωw. A subscript w of the ωw means the warm tone.
[0047]In an embodiment of the present specification, ω represented by Equation 1 above with respect to any one point x of the light absorption layer may be 0.1 or more and 0.7 or less, 0.15 or more and 0.68 or less, or 0.185 or more and 0.65 or less. When satisfying the numerical range, the warm tone may be observed through the light absorption layer and a color desired by a user may be easily indicated among the warm tones.
[0048]In the present specification, the ‘any one point of the light absorption layer’ may mean any one point on the surface or inside the light absorption layer.
[0049]In an embodiment of the present specification, the Tx represents a thickness parameter expressed by Equation 2 above. In the light absorption layer, the warm tone or the cool tone are alternately shown as the thickness is changed and the thickness has a predetermined period T0 and the color is changed. In this case, the Tx may mean a ratio of a light absorption layer thickness T1 at any one point to the predetermined period T0 of the thickness of the light absorption layer. For example, when the predetermined period of the thickness is 60 nm, values of the Tx when the thickness of the light absorption layer is 30 nm, 90 nm, and 150 nm are the same as 0.5.
[0050]In Equation 2 above, T1 represents the thickness of the light absorption layer comprising any one point of the light absorption layer. T1 means the thickness of the light absorption layer comprising one point when one point of the light absorption layer is selected. When a cross section of the decoration member is observed through a scanning electron microscope (SEM) or the like, the interface between the light reflection layer and the light absorption layer may be confirmed, and it may be confirmed that the layer containing the copper nickel oxide is a light absorption layer through the component analysis. In this case, any one point of the light absorption layer may be selected, and the thickness of the light absorption layer comprising any one point may be calculated and applied as T1.
[0051]Equation 2 above shows a periodic function f(T1) according to the thickness T1 of the light absorption layer. The same f(T1) value is shown according to the period T0. This is illustrated in FIG. 35. According to FIG. 35, f(T1) appearing in the range of (0<T1≤T0) appears repeatedly with a constant period T0. For example, f(0.5T0) in the case of T1=0.5T0 and f(1.5T0) in the case of T1=0.5T0+T0 have the same value as 0.5.
[0052]In an embodiment of the present specification, the a, b, and x may be the same as each other or different from each other and each of the a, b, and x may have a value of more than 0 and less than 1.
[0053]According to an embodiment of the present specification, a+b+x=1 may be established.
[0054]The thickness T1 may mean a length in a thickness direction of the light absorption layer in a cross section in a direction perpendicular to a surface direction of the light absorption layer while comprising any one point of the light absorption layer.
[0055]In FIG. 3, a method for determining one point and the thickness of the light absorption layer is illustrated. When any one point (a red point of FIG. 3) of the light absorption layer is selected, a content ratio parameter expressed by Equation 3 is calculated through the component analysis of this point and a width of a line segment which is perpendicular to the surface direction of the light absorption layer among the line segments passing through this point is calculated to calculate the thickness T1.
[0056]Further, the T1 may be achieved by adjusting process pressure used for deposition at the time of forming the light absorption layer, a flow rate of reactive gas to plasma gas, voltage, a deposition time, or a temperature.
[0057]In the decoration member of the present invention, the cool tone or the warm tone repeatedly appears with a constant period according to a thickness change of the light absorption layer. In this case, T0 may be expressed as a “period of the thickness of the light absorption layer in which the warm tone repeatedly appears”.
[0058]The component analysis of the light absorption layer may adopt transmission X-ray component analysis.
[0059]In Equation 3 above, the a means an element content ratio of copper (Cu), the b means the element content ratio of nickel (Ni), and the x means the element content ratio of oxygen (O). The element content ratio of each element of the light absorption layer may be measured by a method which is generally used in a field to which the technology belongs and measured by using X-ray photoelectron spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA, Thermo Fisher Scientific Inc.).
[0060]According to an embodiment of the present specification, the thickness parameter Tx may be in the range of 0.01 to 0.5, preferably in the range of 0.1 to 0.5, and more preferably in the range of 0.125 to 0.5. When the numerical range is satisfied, the warm tone may be more clearly observed in the decoration member.
[0061]In an embodiment of the present specification, the content ratio parameter σx may be in the range of 0.1 to 5, 0.1 to 3, 0.1 to 1.5, and 1 to 1.5, and more preferably, 1.1 to 1.3. When the numerical range is satisfied, the warm tone may be more clearly observed in the decoration member. The ratio between the elements may be achieved by controlling a gas fraction during deposition of the copper nickel oxide.
[0062]Specifically, using X-ray photoelectron spectroscopy (XPS) or electron spectroscopy for Chemical Analysis (ESCA, Thermo Fisher Scientific Inc.), the survey scan in the surface and thickness direction of the light absorption layer is performed and a qualitative analysis is performed and then the quantitative analysis is performed by a narrow scan. In this case, the survey scan and the narrow scan are obtained under a condition of Table 1 below to perform the qualitative and qualitative analyses. Peak background adopts a smart scheme.
TABLE 1ElementScan section binding EnergyStep sizeNarrow(Snapshot)20.89eV0.1eVSurvey−10~1350eV1eV
[0063]In addition, the component analysis may be performed by preparing a light absorbing layer fragment having the same composition as the light absorption layer, before the decoration member is laminated. Alternatively, when a structure of the decoration member is the substrate/the pattern layer/the light reflection layer/the light absorption layer, an outermost edge of the decoration member may be analyzed by the aforementioned method. Further, the light absorption layer may be visually confirmed by observing a cross-sectional photograph of the decoration member. For example, when the structure of the decoration member is the substrate/the pattern layer/the light reflection layer/the light absorption layer, it may be confirmed that the interface exists between respective layers in the cross-sectional photograph of the decoration member and the outermost edge layer corresponds to the light absorption layer.
[0064]In an embodiment of the present specification, a Hue-angle h* in a CIE LCh color space of the light absorption layer may be in the range of 315 to 360°, in the range of 0 to 150°, in the range of 320 to 360° and in the range of 0 to 105°, and in the range of 320 to 360° and 0 to 100°.
[0065]When the Hue-angle h* is in the range, the warm tone may be observed from the decoration member. The warm tone means that the numerical range is satisfied in the CIE LCh color space. The color corresponding to the warm tone is illustrated in FIG. 32 and the color corresponding to the cool tone is illustrated in FIG. 33.
[0066]In an embodiment of the present specification, L in the CIE LCh color space of the light absorption layer may be in the range of o to 100 or 30 to 100.
[0067]In an embodiment of the present specification, C in the CIE LCh color space of the light absorption layer may be in the range of 0 to 100, 1 to 80, or 1 to 60.
[0068]In the present specification, the CIE LCh color space is a CIE Lab color space and here, instead of a* and b* of Cartesian Coordinates, cylinder coordinates C* (chroma, relative color saturation), L* (distance from L axis), and h* (Hue-angle, Hue-angle in CIE Lab hue circle) are used.
[0069]In an embodiment of the present specification, a refractive index n of the light absorption layer at a wavelength of 400 nm may be preferably in the range of 0 to 8, and in the range of 0 to 7, in the range of 0.01 to 3, and in the range of 2 to 2.5. The refractive index n may be calculated as sin θa /sin θb (θa represents an angle of light incident on the surface of the light absorption layer and θb represents an angle of refraction of light inside the light absorption layer).
[0070]In an embodiment of the present specification, the refractive index n of the light absorption layer at a wavelength range of 380 to 780 nm may be preferably in the range of 0 to 8, and in the range of 0 to 7, in the range of 0.01 to 3, and in the range of 2 to 2.5.
[0071]In an embodiment of the present specification, the extinction coefficient k of the light absorption layer at the wavelength of 400 nm may be preferably in the range of more than 0 and 4 or less and in the range of 0.01 to 4 and in the range of 0.01 to 3.5, in the range of 0.01 to 3, and in the range of 0.1 to 1. The extinction coefficient k represents −λ/4πI (dI/dx) (where the extinction coefficient represents a path unit length dx in the light absorption layer, for example, a value acquired by multiplying a reduction fraction dI/I of light intensity per meter by λ/4π, where λ represents the wavelength of light).
[0072]In an embodiment of the present specification, the extinction coefficient k of the light absorption layer in the wavelength range of 380 to 780 nm may be preferably in the range of more than 0 and 4 or less and in the range of 0.01 to 4 and in the range of 0.01 to 3.5, in the range of 0.01 to 3, and in the range of 0.1 to 1. Since the extinction coefficient k is in the range in an entire visible light wavelength range of 400 nm or 380 nm to 780 nm, the entire visible light wavelength range of 400 nm or 380 nm to 780 nm may serve as the light absorption layer within a visible light range.
[0073]As described above, a principle of expressing the color of the light absorption layer having a specific extinction coefficient and refractive index and a principle of color expression of the decoration member expressing the color by adding a dye to a conventional substrate are different. For example, a case of using a scheme of absorbing light by adding a dye to a resin and a case of using a material having the extinction coefficient as described above are different from each other in terms of a spectrum of absorbing light. When the dye is added to the resin to absorb light, an absorption wavelength band is fixed, and only a phenomenon in which the amount of absorption changes with a change in coating thickness occurs. In addition, in order to obtain a desired light absorption amount, a thickness change of at least several micrometers or more is required to adjust the light absorption amount. On the other hand, in a material having the extinction coefficient, even if the thickness varies on a scale of several or tens of nanometers, a wavelength band of absorbed light changes.
[0074]In addition, when the dye is added to the conventional resin, only a specific color by the dye is expressed, and thus various colors may not be exhibited. On the other hand, the light absorption layer of the present invention has an advantage in that by using a specific material rather than the resin, the color may be variously exhibited by an interference phenomenon of light without the addition of the dye.
[0075]According to the embodiments, the light is absorbed on an incident path and a reflection path of the light in the light absorption layer and further, the light is reflected on each of the surface of the light absorption layer and the interface between the light absorption layer 301 and the light reflection layer 201 and two reflected light constructively supplements and destructively interferes with each other.
[0076]In the present specification, the light reflected from the surface of the light absorption layer may be represented by surface reflected light and the light reflected from the interface between the light absorption layer and the light reflection layer may be represented by interface reflected light. FIG. 4 is a schematic diagram of such an operation principle. In FIG. 4, a structure in which the substrate 101 is provided on the light reflection layer 201 is illustrated, but the present specification is not limited thereto and the position of the substrate 101 may be disposed at a different position therefrom.
[0077]In an embodiment of the present specification, the light absorption layer may be constituted by a single layer or two layers or more of multiple layers.
[0078]In an embodiment of the present specification, the light absorption layer may further comprise one or two or more selected from a group consisting of metal, metalloid, and oxide, nitride, oxynitride, and carbide of the metal or the metalloid. The oxide, nitride, oxynitride, or carbide of the metal or the metalloid may be formed by a deposition condition set by those skilled in the art, etc. The light absorption layer may comprise the same metal, metalloid, two or more alloys or oxynitrides as the light reflection layer.
[0079]In an embodiment of the present specification, the thickness T1 of the light absorption layer may be determined according to a desired color in a final structure, for example, may be 1 nm or more and 300 nm or less, 1 nm or more and 30 nm or less, 61 nm or more and 90 nm or less, or 121 nm or more and 150 nm or less.
[0080]In an embodiment of the present specification, the material of the light reflection layer is not particularly limited as long as the material is a material capable of reflecting light, but the light reflectance may be determined according to the material, and for example, the color is easily implemented at a light reflectance of 50% or more. The light reflectance may be measured using an ellipsometer.
[0081]In an embodiment of the present specification, the light reflection layer may be a metal layer, a metal oxide layer, a metal nitride layer, a metal oxynitride layer, or an inorganic layer. The light reflection layer may be constituted by a single layer or constituted by two layers or more of multiple layers.
[0082]In an embodiment of the present specification, the light reflection layer is constituted by a single layer or multiple layers comprising one or two types or more of materials selected from the group consisting of indium (In), titanium (Ti), and tin (Sn), silicon (Si), germanium (Ge), aluminum (Al), copper (Cu), nickel (Ni), vanadium (V), tungsten (W), tantalum (Ta), molybdenum (Mo), neodymium (Nb), iron (Fe), chromium (Cr), cobalt (Co), gold (Au), and silver (Ag) and one or two types or more of materials selected from the group consisting of an oxide, a nitride, or an oxynitride thereof and carbon and a carbon composite.
[0083]In an embodiment of the present specification, the light reflection layer may comprise two or more alloys selected from the above materials, oxides, nitrides or oxynitrides thereof.
[0084]In an embodiment of the present specification, the light reflection layer is manufactured by using an ink comprising carbon or a carbon composite to implement a high resistance reflection layer. The carbon or carbon composite comprises carbon black, CNT, and the like.
[0085]In an embodiment of the present specification, the ink comprising the carbon or carbon composite material may comprise the above-described material or an oxide, a nitride, or an oxynitride thereof and comprise, for example, one or two types or more of oxides selected from the group consisting of indium (In), titanium (Ti), and tin (Sn), silicon (Si), germanium (Ge), aluminum (Al), copper (Cu), nickel (Ni), vanadium (V), tungsten (W), tantalum (Ta), molybdenum (Mo), neodymium (Nb), iron (Fe), chromium (Cr), cobalt (Co), gold (Au), and silver (Ag). A curing process may be additionally performed after printing the ink comprising the carbon or carbon composite.
[0086]In an embodiment of the present specification, when the light reflection layer comprises two or more kinds of materials, two or more kinds of materials may be formed by one process, for example, a deposition or printing method, but a method for first forming the layer with one or more kinds of materials and then additionally forming the layer thereon with one or more kinds of materials may be used. For example, the layer is formed by depositing indium or tin and then the ink comprising the carbon is printed and then cured, thereby forming the light reflection layer. The ink may additionally comprise oxide such as titanium oxide or silicon oxide.
[0087]In an embodiment of the present specification, the thickness of the light reflection layer may be determined according to a desired color in a final structure, and for example, may be 1 nm or more and 100 nm or less, 10 nm or more and 90 nm or less, or 30 nm or more and 90 nm or less.
Light Absorption Layer Structure
[0088]In an embodiment of the present specification, the light absorption layer may exhibit various shapes by adjusting a deposition condition and the like when forming the light absorption layer.
[0089]In an embodiment of the present specification, the light absorption layer comprises two or more points having different thicknesses.
[0090]In an embodiment of the present specification, the light absorption layer comprises two or more regions having different thicknesses.
[0091]In an embodiment of the present specification, the light absorption layer may comprise an inclined surface.
[0092]The example of the structure according to the embodiment is illustrated in FIGS. 5 and 6. FIGS. 5 and 6 illustrate a structure in which the light reflection layer 201 and the light absorption layer 301 are laminated (not illustrated). According to FIGS. 5 and 6, the light absorption layer 301 has two or more points having different thicknesses. According to FIG. 5, the thicknesses of the light absorption layer 301 at points A and B are different from each other. According to FIG. 6, the thicknesses of the light absorption layer 301 at region C and region D are different from each other.
[0093]In an embodiment of the present specification, the light absorption layer comprises at least one region in which a top surface has an inclined surface having an inclination angle greater than 0 degree and 90 degrees or smaller and the light absorption layer comprises at least one region having a thickness different from a thickness in a region having any one inclined surface. The inclined surface may define an angle formed by any one straight line included in the top surface of the light absorption layer and a straight line parallel to the light reflection layer as the inclined surface. For example, the inclined angle of the top surface of the light absorption layer of FIG. 5 may be approximately 20 degrees.
[0094]A surface characteristic such as the inclined surface of the top surface of the light reflection layer may be the same as that of the light absorption layer. For example, by using the deposition method at the time of forming the light absorption layer, the top surface of the light absorption layer may have the same gradient as the top surface of the light reflection layer. However, the gradient of the top surface of the light absorption layer of FIG. 5 is different from the gradient of the top surface of the light reflection layer.
[0095]The structure of the decoration member having the light absorption layer in which the top surface has the inclined surface is illustrated in FIG. 7. In a structure in which the substrate 101, the light reflection layer 201, and the light absorption layer 301 are laminated, a thickness t1 in region E of the light absorption layer 301 and a thickness t2 in region F are different from each other. Reference numeral 401 may be a color film.
[0096]FIG. 7 relates to a light absorption layer having a structure in which inclined surfaces facing each other, i.e., cross sections have a triangular shape. As illustrated in FIG. 7, in the structure of a pattern having the inclined surfaces facing each other, the thicknesses of the light absorption layer on two surfaces having a triangular structure may be different from each other even though the deposition is performed under the same condition. As a result, a light absorption layer having two or more regions with different thicknesses may be formed only by one process. Accordingly, an expression color varies depending on the thickness of the light absorption layer. In this case, when the thickness of the light reflection layer is a predetermined value or more, the thickness does not affect the color change.
[0097]In FIG. 7, a structure in which the substrate 101 is provided on the light reflection layer 201 is illustrated, but the present specification is not limited to such a structure and the position of the substrate 101 may be disposed at a different position therefrom as described above.
[0098]Further, a surface of the substrate 101 of FIG. 7 contacting the light reflection layer 201 is a flat surface, but a surface of the light reflection layer 201 contacting the light reflection layer 201 of the substrate 101 may have a pattern having the same slope as the top surface of the light reflection layer 201. This is illustrated in FIG. 8. In this case, there may be a difference even in thickness of the light absorption layer due to the difference in slope of the pattern of the substrate. However, the present specification is not limited thereto and even though the substrate and the light absorption layer are made to have different slopes by using a different deposition method, dichroism to be described below may be exhibited by differentiating the thicknesses of the light absorption layer at both sides of the pattern.
[0099]In an embodiment of the present specification, the light absorption layer comprises one or more regions in which the thickness gradually changes. In FIG. 9, a structure in which the thickness of the light absorption layer 301 gradually changes is illustrated.
[0100]In an embodiment of the present specification, the light absorption layer comprises at least one region in which the top surface has an inclined surface having an inclination angle greater than 0 degree and 90 degrees or smaller and at least one region having the inclined surface has a structure in which the thickness of the light absorption layer gradually changes. The structure of the light absorption layer comprising the region in which the top surface has the inclined surface is illustrated in FIG. 9. Both regions G and H of FIG. 9 have a structure in which the top surface of the light absorption layer has the inclined surface and the thickness of the light absorption layer gradually changes.
[0101]In the present specification, the structure in which the thickness of the light absorption layer changes means that the cross section in the thickness direction of the light absorption layer comprises a point where the thickness of the light absorption layer is smallest and a point where the thickness of the light absorption layer is largest and the thickness of the light absorption layer increases according to a direction of the point where the thickness of the light absorption layer is smallest to the point where the thickness of the light absorption layer is largest. In this case, the point where the thickness of the light absorption layer is smallest and the point where the thickness of the light absorption layer is largest may mean any point on the interface between the light absorption layer and the light reflection layer.
[0102]In an embodiment of the present specification, the light absorption layer may comprise a first region having a first inclined surface in which the inclined angle is in the range of 1 to 90 degrees and may further comprise two or more regions in which the top surface has an inclined surface having a different inclination direction from the first inclined surface or a different inclined angle from the first inclined surface or