3D printed chamber components configured for lower film stress and lower operating temperature

公开(公告)号:
EP3254305B1
公开(公告)日:
2023-05-10
申请号:
EP2016746946
申请日:
2016-01-15
授权日:
2023-05-10
受理局:
欧洲专利局
专利类型:
授权发明
简单法律状态:
有效
法律状态/事件:
授权
IPC分类号:
B33Y10/00 | B33Y80/00 | H01J37/32 | H01S5/022 | B22F10/14 | B22F10/18 | B22F10/25 | B22F10/28
战略新兴产业分类:
电子核心产业
国民经济行业分类号:
-
当前申请(专利权)人:
APPLIED MATERIALS, INC.
原始申请(专利权)人:
APPLIED MATERIALS, INC.
当前申请(专利权)人地址:
3050 Bowers Avenue, Santa Clara, CA, US
工商统一社会信用代码:
-
工商登记状态:
-
工商注册地址:
-
工商成立日期:
1967-11-10
工商企业类型:
-
发明人:
NARENDRNATH, KADTHALA R. | RAJ, GOVINDA | YOSHIDOME, GOICHI | VASANTHA, BOPANNA ICHETTIRA | KELKAR, UMESH M.
代理机构:
ZIMMERMANN & PARTNER PATENTANWÄLTE MBB
代理人:
-
摘要:
A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber includes a component part body having unitary monolithic construction. The component part body has a textured surface. The textured surface includes a plurality of independent engineered macro features integrally formed with the component part body. The engineered macro features include a macro feature body extending from the textured surface.
技术问题语段:
The patent text discusses the challenges of producing sub-half micron and smaller features in semiconductor devices and the importance of carefully selecting materials to achieve satisfactory levels of electrical performance. The text also highlights the need for improved chamber components that help prevent contamination of processing chambers. The technical problem addressed in the patent is the need for improved chamber components that can prevent contamination during the production of sub-half micron and smaller features.
技术功效语段:
In this patent, a chamber component for a processing chamber is described. The component has a body that is made in a single piece and has a textured surface with various engineered features. These features are made to reduce film stress and adjust the heat transfer in the chamber. The technical effect of this patent is to provide a more efficient and effective chamber component that improves the overall performance of the processing chamber.
权利要求:
1. A chamber component (100) for a PVD processing chamber, the chamber component comprising: a component part body (140) having unitary monolithic construction formed by an additive fabrication technique to have engineered features, the component part body having a textured surface (102), the textured surface comprising: a plurality of independent engineered macro features (104), wherein the engineered macro features include a macro feature body extending from the textured surface, the macro feature body integrally formed with the component part body, and wherein the engineered macro features comprise a plurality of engineered micro features (304) formed thereon, wherein the micro features further include engineered sub-features (314) formed thereon. 2. The chamber component (100) of claim 1, wherein the engineered features are suitable for the engineered macro features, engineered micro features and engineered sub-features, and comprise: an undercut (412) on an outer edge of the engineered features. 3. The chamber component (100) of any of claims 1 or 2, wherein the engineered features are suitable for the engineered macro features, engineered micro features and engineered sub-features, and comprise: an interior void (432). 4. The chamber component (100) of any of claims 1 to 3, wherein the engineered features are suitable for the engineered macro features, engineered micro features and engineered sub-features, and comprise a twisting or helical feature (450) attached to the textured surface. 5. The chamber component (100) of any of claims 1 to 4, wherein the engineered features are suitable for the engineered macro features, engineered micro features and engineered sub-features, and comprise holes (442). 6. The chamber component (100) of claim 1, wherein the macro feature body comprises: a surface facing the component part body. 7. The chamber component (100) of claim 1, wherein the macro feature body comprises: an engineered micro featured formed on a surface of the macro feature body facing an adjacent macro feature body. 8. The chamber component (100) of claim 1, wherein the component part body (140) comprises a chamber liner, a process kit ring, a shield, or coil spacer. 9. The chamber component (100) of claim 1, wherein the macro feature body comprises: a thermal choke. 10. The chamber component (100) of claim 1, wherein the component part body (140) further comprises: an internal surface having a plurality of heat transfer fins; and an external surface on which the engineered macro features are formed. 11. A method of forming a chamber component for a PVD chamber, the method comprising: forming a textured surface on a component part body of the chamber component, the component part body having unitary monolithic construction; wherein forming the textured surface comprises forming independent macro features including a macro feature body extending from the textured surface, the macro feature body being integrally formed with the component body; forming micro features on the macro features; and forming sub-features on the micro features; wherein forming the macro features, the micro features and the sub-features utilizes an additive fabrication technique.
技术领域:
-
背景技术:
-
发明内容:
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具体实施方式:
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